Concepedia

Y.K Lee

YL

3

Publications

65

Citations

3

H-Index

1999

Active since

Affiliations

Nanyang Technological University(Current)

Institute of Microelectronics

Singapore Science Park

Y.K Lee is an author at Nanyang Technological University specializing in applied physics, surface science, and materials science.

Top concepts

Publications per year

1999–2001

3

Publications

3

The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure

Khin Maung Latt, Y.K Lee, S Li et al. · Materials Science and Engineering B · 2001 · 28 citations

, , +10

Study of diffusion barrier properties of ionized metal plasma (IMP) deposited TaN between Cu and SiO2

Y.K Lee, Khin Maung Latt, Jae‐Hyung Kim et al. · Materials Science in Semiconductor Processing · 2000 · 21 citations

, , +8

Study of diffusion barrier properties of ionized metal plasma (IMP) deposited tantalum (Ta) between Cu and SiO2

Y.K Lee, Khin Maung Latt, T. Osipowicz et al. · Materials Science and Engineering B · 1999 · 16 citations

, , +8

Rows per page

1–3 of 3