Concepedia

Eiji Umeda

EU

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Publications

1

Citations

17

H-Index

1

Active since

2003

Affiliations

NEC (Japan)(Current)

Eiji Umeda is an author at NEC (Japan) specializing in proximity effect correction, engineering, and mask proximity effect correction.

Publications per year

2003–2003

1

Publications

1

Mask CD uniformity improvement by dry etching loading effect correction

Jun Kotani, Toshiaki Yanagihara, Eiji Umeda et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 17 citations

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