Concepedia
Statistics
Publications
1
Citations
21
H-Index
Active since
2008
Affiliations
IMEC(Current)
John Hapli is an author at IMEC specializing in mask design, digital lithography, and logic devices.
Publications per year
2008–2008
Interactions of double patterning technology with wafer processing, OPC and design flows
Kevin Lucas, Chris Cork, Alex Miloslavsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 21 citations
Engineering, Design, Digital Design +17
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