Tyler Kent - Concepedia

Author

Tyler Kent

University of California San Diego

Also Known As

T Kent, T. J Kent, T. J. Kent, Tyler J. Kent, Tyler Kent

Publications

594

Citations

H-Index

Concepts

All Affiliations

University of California San Diego University of California, Santa Barbara Texas State University Stanford University

About

Tyler Kent is an author at University of California San Diego specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	519
2	Applied Physics	5	5	227
3	Chemistry	4	4	473
4	Chemical Engineering	2	2	376
5	Natural Sciences	1	1	56

Tyler Kent

Publications

552

Citations

H-Index

Page 1

	Year	Citations
A low band gap, solution processable oligothiophene with a dialkylated diketopyrrolopyrrole chromophore for use in bulk heterojunction solar cells Arnold Tamayo, Xuan-Dang Dang, Bright Walker, Applied Physics Letters Solution Processable OligothiopheneEngineeringOrganic ElectronicsOrganic Solar CellOrganic Chemistry	2009	292
Influence of alkyl substituents and thermal annealing on the film morphology and performance of solution processed, diketopyrrolopyrrole-based bulk heterojunction solar cells Arnold Tamayo, Tyler Kent, Mananya Tantitiwat, Energy & Environmental Science Atomic Force MicroscopyEngineeringOrganic ElectronicsOrganic Solar CellOrganic Chemistry	2009	84
Atomic Imaging of the Irreversible Sensing Mechanism of NO<sub>2</sub> Adsorption on Copper Phthalocyanine Jun Hong Park, James E. Royer, Evgeniy Chagarov, Journal of the American Chemical Society EngineeringCupc LayerChemistryCopper PhthalocyaninePhotophysical Property	2013	56
Arsenic decapping and pre-atomic layer deposition trimethylaluminum passivation of Al2O3/InGaAs(100) interfaces Jaesoo Ahn, Tyler Kent, Evgueni Chagarov, Applied Physics Letters Materials ScienceMaterials EngineeringAluminium NitrideEpitaxial GrowthEngineering	2013	41
InGaAs surface preparation for atomic layer deposition by hydrogen cleaning and improvement with high temperature anneal Wilhelm Melitz, Jian Shen, Tyler Kent, Journal of Applied Physics EngineeringSitu Atomic ScaleIntegrated CircuitsChemical DepositionHydrogen Cleaning	2011	29
Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1− x(001) and SixGe1− x(110) Mary Edmonds, Kasra Sardashti, Steven Wolf, The Journal of Chemical Physics	2017	19
The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces Tyler Kent, Kechao Tang, Varistha Chobpattana, The Journal of Chemical Physics Materials EngineeringMaterials ScienceElectrical EngineeringSurface PreparationEngineering	2015	17
Atomic imaging of atomic layer deposition oxide nucleation with trimethylaluminum on As-rich InGaAs(001) 2 × 4 vs Ga/In-rich InGaAs(001) 4 × 2 Wilhelm Melitz, Tyler Kent, Andrew C. Kummel, The Journal of Chemical Physics	2012	14

Page 1