R. Springer

Dry etch improvements in the SOI wafer flow process for IPL stencil mask fabrication

Florian Letzkus, Joerg Butschke, B. Höfflinger et al. · Microelectronic Engineering · 2000 · 35 citations

Wafer Scale Processing, Engineering, Advanced Packaging (Semiconductors) +7

Ion projection direct structuring for patterning of magnetic media

Andreas Dietzel, Rüdiger Berger, H. Grimm et al. · IEEE Transactions on Magnetics · 2002 · 33 citations

Engineering, Microscopy, Magnetic Resonance +20

An All-Aqueous Thermally Regenerative Ammonia Battery Chemistry Using Cu(I, II) Redox Reactions

R. Springer, Nicholas R. Cross, Serguei N. Lvov et al. · Journal of The Electrochemical Society · 2021 · 31 citations

CARS thermometry in a supersonic combustor for CFD code validation

Andrew D. Cutler, Paul M. Danehy, R. Springer et al. · 2002 · 29 citations · Full text

Aeroacoustics, Engineering, Turbulence +19

SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, B. Höfflinger et al. · Microelectronic Engineering · 1999 · 26 citations

Wafer Scale Processing, Engineering, Microfabrication +6