Yutaka Kouzuma

Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda et al. · Japanese Journal of Applied Physics · 2017 · 58 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori Shinoda et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2021 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si

Nobuya Miyoshi, Kazunori Shinoda, Hiroyuki Kobayashi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2021 · 20 citations

Engineering, Materials Engineering, Materials Science +17