Concepedia

Seiichi Isomae

SI

22

Publications

552

Citations

15

H-Index

1974

Active since

Affiliations

Hitachi (Japan)(Current)

Seiichi Isomae is an author at Hitachi (Japan) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMechanics Of MaterialsMicroelectronicsCrystalline DefectsSolid MechanicsSurface ScienceThin FilmsMicrostructure

Publications per year

1974–2002

22

Publications

22

Hydrogen passivation of iron-related hole traps in silicon

Masami Kouketsu, Seiichi Isomae · Journal of Applied Physics · 1996 · 59 citations

Hydrogen Passivation, Ion Implantation, Semiconductor Device +9

Stress distributions in silicon crystal substrates with thin films

Seiichi Isomae · Journal of Applied Physics · 1981 · 58 citations

Engineering, Mechanical Engineering, Silicon On Insulator +19

Dislocation Generation at Si3 N 4 Film Edges on Silicon Substrates and Viscoelastic Behavior of SiO2 Films

Seiichi Isomae, Y. Tamaki, A. Yajima et al. · Journal of The Electrochemical Society · 1979 · 51 citations

Engineering, Thin Film Process Technology, Silicon On Insulator +18

Stress in silicon at Si3N4/SiO2 film edges and viscoelastic behavior of SiO2 films

Seiichi Isomae · Journal of Applied Physics · 1985 · 45 citations

Engineering, Silicon On Insulator, Sio2 Films +16

Depth profiles of interstitial oxygen concentrations in silicon subjected to three-step annealing

Seiichi Isomae, Shigeru Aoki, Kikuo Watanabe · Journal of Applied Physics · 1984 · 34 citations

Rows per page

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