R. Tonini

Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition

A. Sassella, A. Borghesi, Federico Corni et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 92 citations · Full text

Engineering, Chemistry, Silicon On Insulator +16

Formation of vacancy clusters and cavities in He-implanted silicon studied by slow-positron annihilation spectroscopy

R.S. Brusa, Grzegorz P. Karwasz, N. Tiengo et al. · Physical review. B, Condensed matter · 2000 · 71 citations · Full text

Open Volume Defect, Engineering, Positron Annihilation Spectroscopy +17

Vacancy-hydrogen interaction in H-implanted Si studied by positron annihilation

R.S. Brusa, M. Duarte Naia, A. Zecca et al. · Physical review. B, Condensed matter · 1994 · 40 citations

Materials Science, Materials Engineering, Defect Tolerance +15

Paradoxical Enhancement of the Power Factor of Polycrystalline Silicon as a Result of the Formation of Nanovoids

Bruno Lorenzi, Dario Narducci, R. Tonini et al. · Journal of Electronic Materials · 2014 · 31 citations · Full text

Materials Science, Nanocrystalline Material, Engineering +10

High-dose helium-implanted single-crystal silicon: Annealing behavior

R. Tonini, Federico Corni, Stefano Frabboni et al. · Journal of Applied Physics · 1998 · 30 citations · Full text

Materials Science, Ion Implantation, Annealing Behavior +12