Stefan Tinck

Combining experimental and modelling approaches to study the sources of reactive species induced in water by the COST RF plasma jet

Yury Gorbanev, Christof Verlackt, Stefan Tinck et al. · Physical Chemistry Chemical Physics · 2018 · 79 citations · Full text

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

Kenji Ishikawa, Kazuhiro Karahashi, Takanori Ichiki et al. · Japanese Journal of Applied Physics · 2017 · 51 citations · Full text

Engineering, Two-dimensional Materials, Chemistry +21

Simulation of an Ar/Cl₂inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments

Stefan Tinck, Werner Boullart, Annemie Bogaerts · Journal of Physics D Applied Physics · 2008 · 49 citations

Engineering, Plasma Science, Plasma Physics +22

Investigation of etching and deposition processes of Cl₂/O₂/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments

Stefan Tinck, Werner Boullart, Annemie Bogaerts · Journal of Physics D Applied Physics · 2009 · 46 citations

Electrical Engineering, Engineering, Plasma–surface Simulations +15

Modeling Cl₂/O₂/Ar inductively coupled plasmas used for silicon etching: effects of SiO₂chamber wall coating

Stefan Tinck, Werner Boullart, Annemie Bogaerts · Plasma Sources Science and Technology · 2011 · 40 citations

Engineering, Surface Loss Probabilities, Plasma Physics +18