Hirotaka Kaku - Concepedia

Author

Hirotaka Kaku

Hiroshima University

Also Known As

H. Kaku, Hirotaka Kaku

Publications

253

Citations

H-Index

Concepts

All Affiliations

Hiroshima University

About

Hirotaka Kaku is an author at Hiroshima University specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	232
2	Applied Physics	9	9	232
3	Materials Science	6	6	165
4	Electrical Engineering	4	4	103
5	Materials Engineering	1	1	17

Hirotaka Kaku

Publications

232

Citations

H-Index

Page 1

	Year	Citations
A new crystallization technique of Si films on glass substrate using thermal plasma jet Hirotaka Kaku, Seiichiro Higashi, Hitoshi Taniguchi, Applied Surface Science Materials ScienceSi FilmsEngineeringMicrofabricationThermal Plasma Jet	2005	42
Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor Seiichiro Higashi, Hirotaka Kaku, Hideki Murakami, Japanese Journal of Applied Physics EngineeringThin-film TransistorThin Film Process TechnologyPlasma ProcessingCrystallized Films	2004	37
Analysis of Transient Temperature Profile During Thermal Plasma Jet Annealing of Si Films on Quartz Substrate Tatsuya Okada, Seiichiro Higashi, Hirotaka Kaku, Japanese Journal of Applied Physics Electrical EngineeringSi FilmsEngineeringPlasma ElectronicsQuartz Substrate	2006	25
Characterization of Microcrystalline Silicon Thin Film Transistors Fabricated by Thermal Plasma Jet Crystallization Technique Seiichiro Higashi, Kenji Sugakawa, Hirotaka Kaku, Japanese Journal of Applied Physics EngineeringIntegrated CircuitsThin Film Process TechnologySilicon On InsulatorPlasma Processing	2010	24
In-situ Measurement of Temperature Variation in Si Wafer during Millisecond Rapid Thermal Annealing Induced by Thermal Plasma Jet Irradiation H. Furukawa, Seiichiro Higashi, Tatsuya Okada, Japanese Journal of Applied Physics EngineeringIntegrated CircuitsSilicon On InsulatorPlasma ProcessingTransient Temperature Profile	2008	24
Crystallization of Si in Millisecond Time Domain Induced by Thermal Plasma Jet Irradiation Seiichiro Higashi, Hirotaka Kaku, Tatsuya Okada, Japanese Journal of Applied Physics EngineeringIntegrated CircuitsThin Film Process TechnologySilicon On InsulatorPlasma Processing	2006	23
Crystallization of Si films on glass substrate using thermal plasma jet Seiichiro Higashi, Hirotaka Kaku, Hitoshi Taniguchi, Thin Solid Films Materials ScienceSi FilmsEngineeringThermal Plasma JetMicrofabrication	2005	22
Control of substrate surface temperature in millisecond annealing technique using thermal plasma jet Tatsuya Okada, Seiichiro Higashi, Hirotaka Kaku, Thin Solid Films EngineeringMicrofabricationThermal Plasma JetSurface ScienceApplied Physics	2007	18
Formation of Low-Defect-Concentration Polycrystalline Silicon Films by Thermal Plasma Jet Crystallization Technique T. Yorimoto, Seiichiro Higashi, Hirotaka Kaku, Japanese Journal of Applied Physics Si FilmsOptical MaterialsEngineeringSilicon On InsulatorPlasma Processing	2008	17

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