Hirotaka Kaku

A new crystallization technique of Si films on glass substrate using thermal plasma jet

Hirotaka Kaku, Seiichiro Higashi, Hitoshi Taniguchi et al. · Applied Surface Science · 2005 · 42 citations

Materials Science, Si Films, Engineering +8

Application of Plasma Jet Crystallization Technique to Fabrication of Thin-Film Transistor

Seiichiro Higashi, Hirotaka Kaku, Hideki Murakami et al. · Japanese Journal of Applied Physics · 2004 · 37 citations

Engineering, Thin-film Transistor, Thin Film Process Technology +18

Analysis of Transient Temperature Profile During Thermal Plasma Jet Annealing of Si Films on Quartz Substrate

Tatsuya Okada, Seiichiro Higashi, Hirotaka Kaku et al. · Japanese Journal of Applied Physics · 2006 · 25 citations

Electrical Engineering, Si Films, Engineering +15

Characterization of Microcrystalline Silicon Thin Film Transistors Fabricated by Thermal Plasma Jet Crystallization Technique

Seiichiro Higashi, Kenji Sugakawa, Hirotaka Kaku et al. · Japanese Journal of Applied Physics · 2010 · 24 citations

Engineering, Integrated Circuits, Thin Film Process Technology +17

In-situ Measurement of Temperature Variation in Si Wafer during Millisecond Rapid Thermal Annealing Induced by Thermal Plasma Jet Irradiation

H. Furukawa, Seiichiro Higashi, Tatsuya Okada et al. · Japanese Journal of Applied Physics · 2008 · 24 citations

Engineering, Integrated Circuits, Silicon On Insulator +18