Nila Pal

Gate Interface Engineering for Subvolt Metal Oxide Transistor Fabrication by Using Ion-Conducting Dielectric with Mn₂O₃ Gate Interface

Nila Pal, Anand Sharma, Vishwas Acharya et al. · ACS Applied Electronic Materials · 2019 · 50 citations

Oxide Heterostructures, Materials Science, Electrical Engineering +15

Ultra-Low Voltage Metal Oxide Thin Film Transistor by Low-Temperature Annealed Solution Processed LiAlO2 Gate Dielectric

Anand Sharma, Nitesh K. Chourasia, Vishwas Acharya et al. · Electronic Materials Letters · 2019 · 37 citations

Materials Science, Electrical Engineering, Lialo2 Gate Dielectric +8

Solution processed low band gap ion-conducting gate dielectric for low voltage metal oxide transistor

Nitesh K. Chourasia, Anand Sharma, Vishwas Acharya et al. · Journal of Alloys and Compounds · 2018 · 36 citations

Materials Science, Electrical Engineering, Semiconductor Device +9

Role of Electron Donation of TiO₂ Gate Interface for Developing Solution-Processed High-Performance One-Volt Metal-Oxide Thin-Film Transistor Using Ion-Conducting Gate Dielectric

Anand Sharma, Nitesh K. Chourasia, Nila Pal et al. · The Journal of Physical Chemistry C · 2019 · 29 citations

Coexistence of Electrochromism and Bipolar Nonvolatile Memory in a Single Viologen

Ranjeev Kumar Parashar, Suchita Kandpal, Nila Pal et al. · ACS Applied Materials & Interfaces · 2023 · 23 citations