Statistics
Publications
1
Citations
13
H-Index
1
Active since
2017
Affiliations
IBM (United States)(Current)
Danielle Durrant is an author at IBM (United States) specializing in pattern collapse, pattern defect reduction, and electrical engineering.
Publications per year
2017–2017
1
1
Driving down defect density in composite EUV patterning film stacks
Luciana Meli, Karen Petrillo, Anuja De Silva et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 13 citations
Natural Sciences, Electrical Engineering, Manufacturing Engineering +17
1–1 of 1