Nicholas A. Strnad

Density and size effects on the thermal conductivity of atomic layer deposited TiO2 and Al2O3 thin films

Mallory E. DeCoster, Kelsey Meyer, Brandon D. Piercy et al. · Thin Solid Films · 2018 · 50 citations

Materials Science, Engineering, Surface Science +8

Dielectric, energy storage, and loss study of antiferroelectric-like Al-doped HfO2 thin films

Alexis Payne, Owen Brewer, Asher C. Leff et al. · Applied Physics Letters · 2020 · 45 citations

Growth of thin film ferroelectric PZT, PHT, and antiferroelectric PHO from atomic layer deposition precursors

Nicholas A. Strnad, Brendan Hanrahan, Daniel M. Potrepka et al. · Journal of the American Ceramic Society · 2020 · 22 citations

Materials Science, Materials Engineering, Pzt Thin Films +14

The other model antiferroelectric: PbHfO3 thin films from ALD precursors

Brendan Hanrahan, Cosme Milesi-Brault, Asher C. Leff et al. · APL Materials · 2021 · 17 citations · Full text

Materials Engineering, Materials Science, Epitaxial Growth +14

Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS

Nicholas A. Strnad, Wendy L. Sarney, G. B. Rayner et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2022 · 14 citations

Aluminium Nitride, Engineering, Chemical Deposition +20