Concepedia

J. Hötzel

JH

Statistics

Publications

4

Citations

175

H-Index

4

Active since

2000

Affiliations

Tokyo Electron (Japan)(Current)

J. Hötzel is an author at Tokyo Electron (Japan) specializing in materials engineering, engineering, and materials science.

Publications per year

2000–2015

4

Publications

4

High-Efficiency Amorphous Silicon Devices on LPCVD-ZnO TCO Prepared in Industrial KAI TM-M R&D Reactor

S. Benagli, D. Borrello, J. Meier et al. · EU PVSEC · 2009 · 80 citations · Full text

, , +15

Improved conversion efficiencies of thin-film silicon tandem (MICROMORPH™) photovoltaic modules

Julian S. Cashmore, Marco Apolloni, Antonio Braga et al. · Solar Energy Materials and Solar Cells · 2015 · 56 citations

, , +16

Record 12.34% stabilized conversion efficiency in a large area thin‐film silicon tandem (MICROMORPH™) module

Julian S. Cashmore, Marco Apolloni, Antonio Braga et al. · Progress in Photovoltaics Research and Applications · 2015 · 27 citations · Full text

, , +17

Structural and electrical properties of silicon epitaxial layers grown by LPE on highly resistive monocrystalline substrates

Radovan Kopecek, K. Peter, J. Hötzel et al. · Journal of Crystal Growth · 2000 · 12 citations

, , +16

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