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1
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21
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Active since
1999
J. W. Park is an author specializing in mask fabrication, plasma-assisted chemical vapor deposition, and beam exposure.
Publications per year
1999–1999
Selective-area formation of Si microstructures using ultrathin SiO2 mask layers
Tetsuji Yasuda, Doo-Sup Hwang, J. W. Park et al. · Applied Physics Letters · 1999 · 21 citations
Engineering, Materials Engineering, Materials Science +17
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