K. Maeshige

Functional design of a pulsed two-frequency capacitively coupled plasma in CF4/Ar for SiO2 etching

K. Maeshige, Gentaro Washio, Takashi Yagisawa et al. · Journal of Applied Physics · 2002 · 78 citations

Electrical Engineering, Two-frequency Ccp, Functional Design +12

Effect of aspect ratio on topographic dependent charging in oxide etching

Jun Matsui, K. Maeshige, Toshiaki Makabe · Journal of Physics D Applied Physics · 2001 · 47 citations

Engineering, Electron-beam Lithography, Surface Conductance +18

Prediction of a Radial Variation of Plasma Structure and Ion Distributions in the Wafer Interface in Two-Frequency Capacitively Coupled Plasma

Takashi Yagisawa, K. Maeshige, Takashi Shimada et al. · IEEE Transactions on Plasma Science · 2004 · 34 citations

Radial Uniformity, Electrical Engineering, Plasma Electronics +15

Vertically integrated computer-aided design for device processing

Toshiaki Makabe, K. Maeshige · Applied Surface Science · 2002 · 22 citations

Physical Design (Electronics), Engineering, Computer Design +6

Predictive study of a plasma structure and function in reactive ion etcher driven by very high frequency: Validity of an extended two-dimensional relaxation continuum model

K. Maeshige, Masao Hasebe, Yukio Yamaguchi et al. · Journal of Applied Physics · 2000 · 12 citations

Engineering, Microscopy, Plasma Physics +17