Concepedia

L. Berenbaum

LB

Statistics

Publications

6

Citations

295

H-Index

6

Active since

1968

Affiliations

IBM (United States)(Current)

IBM Research - Thomas J. Watson Research Center

L. Berenbaum is an author at IBM (United States) specializing in thin films, applied physics, and engineering.

Top concepts

Thin FilmsEngineeringApplied PhysicsMaterial ScienceSurface ScienceMaterials EngineeringMicrostructureElectronic PackagingCorrosionMicroelectronics

Publications per year

1968–1974

6

Publications

6

RESISTANCE MONITORING AND EFFECTS OF NONADHESION DURING ELECTROMIGRATION IN ALUMINUM FILMS

R. Rosenberg, L. Berenbaum · Applied Physics Letters · 1968 · 154 citations

Materials Science, Materials Engineering, Electromigration Technique +15

Electromigration Damage of Grain-Boundary Triple Points in Al Thin Films

L. Berenbaum · Journal of Applied Physics · 1971 · 53 citations

Materials Engineering, Materials Science, Aluminium Nitride +14

Surface topology changes during electromigration in metallic thin film stripes

L. Berenbaum, R. Rosenberg · Thin Solid Films · 1969 · 42 citations

Materials Science, Electromigration Technique, Engineering +7

STUDY OF FAILURE MECHANISMS IN Al–Cu THIN FILMS BY HIGH-VOLTAGE ELECTRON MICROSCOPY

L. Berenbaum, B.K. Patnaik · Applied Physics Letters · 1971 · 18 citations

Materials Science, Materials Engineering, Aluminium Nitride +14

Electromigration-induced failures in thin-film Al-Cu conductors

B. Agarwala, L. Berenbaum, P. P. Peressini · Journal of Electronic Materials · 1974 · 17 citations

Electrical Engineering, Electromigration Technique, Engineering +7

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