Concepedia

Tomoji Ohishi

TO

32

Publications

620

Citations

17

H-Index

1982

Active since

Affiliations

Shibaura Institute of Technology(Current)

Nagoya University

Hitachi (Japan)

National Institute for Materials Science

Japan Science and Technology Agency

Tomoji Ohishi is an author at Shibaura Institute of Technology specializing in engineering, materials science, and applied physics.

Top concepts

EngineeringMaterial ScienceApplied PhysicsChemistryThin FilmsSurface ScienceChemical EngineeringElectrochemistryOptical MaterialsElectrical Engineering

Publications per year

1982–2021

32

Publications

32

Synthesis and properties of tantalum oxide films prepared by the sol-gel method using photo-irradiation

Tomoji Ohishi, S. Maekawa, Akira Katoh · Journal of Non-Crystalline Solids · 1992 · 59 citations

Materials Science, Photochemistry, Photo-electrochemical Cell +3

Hafnium silicate gate dielectrics in GaN metal oxide semiconductor capacitors

Toshihide Nabatame, Erika Maeda, Mari Inoue et al. · Applied Physics Express · 2019 · 37 citations

Wide-bandgap Semiconductor, Engineering, Hafnium Silicate +16

Effect of ultrasound sonication on electroplating of iridium

Takashi Ohsaka, Motohiro Isaka, Katsuhiko Hirano et al. · Ultrasonics Sonochemistry · 2007 · 35 citations

Materials Science, Sonoelectrochemistry, Engineering +3

Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation

S. Maekawa, Tomoji Ohishi · Journal of Non-Crystalline Solids · 1994 · 33 citations

Materials Science, Engineering, Surface Science +8

Characteristics of Al <sub>2</sub> O <sub>3</sub> /native oxide/n-GaN capacitors by post-metallization annealing

Kazuya Yuge, Toshihide Nabatame, Yoshihiro Irokawa et al. · Semiconductor Science and Technology · 2019 · 27 citations

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