Jeffrey T. Roberts

Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide

Ryan C. Smith, Tiezhong Ma, Noel Hoilien et al. · Advanced Materials for Optics and Electronics · 2000 · 143 citations

Engineering, Vacuum Device, Chemistry +16

Size-Selected Nanoparticle Chemistry:  Kinetics of Soot Oxidation

Kelly J. Higgins, Heejung Jung, David B. Kittelson et al. · The Journal of Physical Chemistry A · 2001 · 127 citations

New Experimental Method, Chemical Engineering, High Temperature Aerosol +12

Interaction of Hydrogen Chloride with an Ultrathin Ice Film: Observation of Adsorbed and Absorbed States

James D. Graham, Jeffrey T. Roberts · The Journal of Physical Chemistry · 1994 · 113 citations

Hydrogen Chloride, Engineering, Chemical Analysis +18

Toward an Understanding of the Surface Chemical Properties of Ice:  Differences between the Amorphous and Crystalline Surfaces

Jason E. Schaff, Jeffrey T. Roberts · The Journal of Physical Chemistry · 1996 · 107 citations

Engineering, Absorption Spectroscopy, Chemistry +21

Deduction of reaction mechanisms for surface processes: desulfurization of organic sulfides and thiols on molybdenum(110)

C. M. Friend, Jeffrey T. Roberts · Accounts of Chemical Research · 1988 · 105 citations

Chemical Engineering, Chemical Measurement, Engineering +15