High ε gate dielectrics Gd2O3 and Y2O3 for silicon

J. Kwo, M. Hong, A. R. Kortan, +7

Applied Physics Letters

SemiconductorsMaterials ScienceElectrical EngineeringY2o3 FilmsEngineering +13

Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon

K. T. Queeney, M. K. Weldon, Jane P. Chang, +4

Journal of Applied Physics

Materials ScienceEngineeringPhysicsOptical PropertiesSi Suboxide Signal +11

Si–H bending modes as a probe of local chemical structure: Thermal and chemical routes to decomposition of H2O on Si(100)-(2×1)

M. K. Weldon, K. T. Queeney, Alejandra B. Gurevich, +3

The Journal of Chemical Physics

Materials ScienceLocal Chemical StructureEngineeringSurface ChemistrySurface Analysis +11

Reactions of Persistent Carbenes with Hydrogen-Terminated Silicon Surfaces

Aleksandr V. Zhukhovitskiy, Michael G. Mavros, K. T. Queeney, +3

Journal of the American Chemical Society

The surface science of semiconductor processing: gate oxides in the ever-shrinking transistor

M. K. Weldon, K. T. Queeney, Joseph Eng, +2

Surface Science

SemiconductorsSemiconductor TechnologyElectrical EngineeringEngineeringEver-shrinking Transistor +7

Infrared spectroscopic analysis of an ordered Si/SiO2 interface

K. T. Queeney, Nicole Herbots, Justin M. Shaw, +2

Applied Physics Letters

Ordered SiOptical MaterialsEngineeringOptoelectronic DevicesIntegrated Circuits +17

Mechanistic studies of silicon oxidation

M. K. Weldon, K. T. Queeney, Yves J. Chabal, +2

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringOxidation ResistanceChemistrySilicon On InsulatorSemiconductor Nanostructures +15

Infrared Spectroscopy for Chemically Specific Sensing in Silicon-Based Microreactors

Rachel Herzig-Marx, K. T. Queeney, Rebecca J. Jackman, +2

Analytical Chemistry

Chemical EngineeringFourier TransformEngineeringSurface FunctionalizationMicrofabrication +11

In-Situ FTIR Studies of Reactions at the Silicon/Liquid Interface:  Wet Chemical Etching of Ultrathin SiO₂ on Si(100)

K. T. Queeney, Hirokazu Fukidome, E. E. Chaban, +1

The Journal of Physical Chemistry B

Optical MaterialsEngineeringIn-situ Ftir StudiesOptoelectronic DevicesIntegrated Circuits +22

Production of Highly Homogeneous Si(100) Surfaces by H₂O Etching:  Surface Morphology and the Role of Strain

Marc F. Faggin, Sara K. Green, Ian T. Clark, +2

Journal of the American Chemical Society