Wonjin Ban

Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD

Sungyool Kwon, Yoon‐Soo Park, Wonjin Ban et al. · Vacuum · 2020 · 32 citations

Materials Engineering, Materials Science, Engineering +6

Al2O3 thin films prepared by plasma-enhanced chemical vapor deposition of dimethylaluminum isopropoxide

Wonjin Ban, Sungyool Kwon, Jae Hyun Nam et al. · Thin Solid Films · 2017 · 18 citations

Materials Science, Aluminium Nitride, Dimethylaluminum Isopropoxide +8

Ultralow dielectric constant SiCOH films by plasma enhanced chemical vapor deposition of decamethylcyclopentasiloxane and tetrakis(trimethylsilyloxy)silane precursors

Yoon‐Soo Park, Hyuna Lim, Sungyool Kwon et al. · Thin Solid Films · 2021 · 18 citations

Materials Science, Engineering, Surface Science +5

Relationship between bonding characteristics and etch-durability of amorphous carbon layer

Joonhyuk Kwon, S.Y.L. Park, Ki-Soo Seo et al. · Thin Solid Films · 2013 · 11 citations

Materials Science, Materials Engineering, Engineering +7

Single Precursor Based Ultra-Low <i>k</i> Thin Film Deposited with Tetrakis(trimethylsilyloxy)silane in PECVD System

Sungyool Kwon, Wonjin Ban, Hoonbae Kim et al. · Science of Advanced Materials · 2018 · 10 citations