L. M. Williams

Structural properties of titanium dioxide films deposited in an rf glow discharge

L. M. Williams, Dennis W. Hess · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1983 · 159 citations

Engineering, Glow Discharge, Thin Film Process Technology +19

Epitaxial Hg1−<i>x</i>Cd<i>x</i>Te growth by low-temperature metalorganic chemical vapor deposition

P.-Y. Lu, C.-H. Wang, L. M. Williams et al. · Applied Physics Letters · 1986 · 73 citations

Materials Engineering, Materials Science, Thermal Precracking Technique +13

III–V dilute nitride-based multi-quantum well solar cell

A. Freundlich, A. Fotkatzikis, L. Bhusal et al. · Journal of Crystal Growth · 2007 · 49 citations

Semiconductors, Semiconductor Technology, Engineering +5

Plasma enhanced chemical vapor deposition of titanium diboride films

L. M. Williams · Applied Physics Letters · 1985 · 31 citations

Materials Science, High Temperature Materials, Engineering +11

Crystal orientation of CdTe film on GaAs by metal–organic chemical vapor deposition

P.-Y. Lu, L. M. Williams, S. N. G. Chu · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 30 citations

Engineering, Cdte Growth, Semiconductors +16