Julia D. Lenef

Causes of the Difference Between Hall Mobility and Field-Effect Mobility for p-Type RF Sputtered Cu₂O Thin-Film Transistors

Jaesung Jo, Julia D. Lenef, Kishwar Mashooq et al. · IEEE Transactions on Electron Devices · 2020 · 31 citations

Engineering, Cuprous Oxide, Thin Film Process Technology +16

Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology

Julia D. Lenef, Jaesung Jo, Orlando Trejo et al. · The Journal of Physical Chemistry C · 2021 · 27 citations · Full text

Engineering, Optoelectronic Devices, Thin Film Process Technology +21

Integrating Structural Colors with Additive Manufacturing Using Atomic Layer Deposition

Benjamin Rorem, Tae‐Hee Cho, Nazanin Farjam et al. · ACS Applied Materials & Interfaces · 2022 · 17 citations

Materials Science, Chemical Engineering, Optical Materials +13

Visible-Light-Driven Photocatalysts for Self-Cleaning Transparent Surfaces

Andrew J. Gayle, Julia D. Lenef, Park A. Huff et al. · Langmuir · 2022 · 15 citations

Atomic Layer Deposition of Cu Electrocatalysts on Gas Diffusion Electrodes for CO₂ Reduction

Julia D. Lenef, Si Young Lee, Kalyn M. Fuelling et al. · Nano Letters · 2023 · 12 citations · Full text