Samrina Sahir

Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning

Samrina Sahir, Nagendra Prasad Yerriboina, So-Young Han et al. · Applied Surface Science · 2021 · 56 citations

Materials Science, Materials Engineering, Wafer Scale Processing +10

Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process

Kwang-Min Han, So-Young Han, Samrina Sahir et al. · ECS Journal of Solid State Science and Technology · 2020 · 39 citations

Engineering, Contamination Behavior, Chemistry +16

Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers

Maneesh Kumar Poddar, Palwasha Jalalzai, Samrina Sahir et al. · Applied Surface Science · 2020 · 32 citations

Materials Engineering, Materials Science, Chemical Engineering +9

Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning

Samrina Sahir, Nagendra Prasad Yerriboina, So-Young Han et al. · Microelectronic Engineering · 2021 · 24 citations

Chemical Engineering, Engineering, Environmental Engineering +4

The Adhesion and Removal Mechanism of Ceria Particles for STI Post-CMP Cleaning Process

Nagendra Prasad Yerriboina, Samrina Sahir, So-Young Han et al. · ECS Transactions · 2019 · 16 citations

Materials Science, Chemical Engineering, Engineering +12