Ju‐Young Yun - Concepedia

Author

Ju‐Young Yun

Korea Research Institute of Standards and Science ORCID

Also Known As

J. -Y. Yun, J.-Y. Yun, J.Y. Yun, Ju-Young Yun, JuYoung Yun, Juyoung Yun, Ju‐Young Yun, Yun, Juyoung

131

Publications

1.3K

Citations

H-Index

Concepts

All Affiliations

Korea Research Institute of Standards and Science Korea University of Science and Technology Hanyang University Pohang University of Science and Technology Daejeon University

About

Ju‐Young Yun is an author at Korea Research Institute of Standards and Science specializing in engineering, materials science, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	28	793
2	Chemical Engineering	12	13	280
3	Chemistry	12	12	206
4	Applied Physics	10	10	429
5	Biomedical Engineering	1	1	12

Ju‐Young Yun

Publications

1.2K

Citations

H-Index

Page 1

	Year	Citations
High-performance NO2 gas sensor based on ZnO nanorod grown by ultrasonic irradiation Eugene Oh, Ho-Yun Choi, Seungho Jung, Sensors and Actuators B Chemical Materials ScienceEngineeringNanotechnologyGas SensorOxide Electronics	2009	201
Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition Kyoung-Mun Kim, Jin Sub Jang, Soon‐Gil Yoon, Materials	2020	69
Structural color switching with a doped indium-gallium-zinc-oxide semiconductor Inki Kim, Ju‐Young Yun, Trevon Badloe, Photonics Research Materials ScienceElectrical EngineeringStructural ColorStructural Coloration TechniquesLithography-free Color Filter	2020	58
Comparison of Tetrakis(dimethylamido)titanium and Tetrakis(diethylamido)titanium as Precursors for Metallorganic Chemical Vapor Deposition of Titanium Nitride Ju‐Young Yun, Man‐Young Park, Shi‐Woo Rhee Journal of The Electrochemical Society	1999	54
Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y2O3 and YF3 Coatings under NF3 Plasma Je-Boem Song, Jin‐Tae Kim, Seong‐Geun Oh, Coatings Materials EngineeringMaterials ScienceChemical EngineeringThermal Spray CoatingYf3 Coatings	2019	50
Enhancing the Contact between a-IGZO and Metal by Hydrogen Plasma Treatment for a High-Speed Varactor (>30 GHz) Hyuk Park, Ju‐Young Yun, Seongmin Park, ACS Applied Electronic Materials EngineeringMetal ElectrodeThin Film Process TechnologyPlasma ProcessingPlasma Electronics	2022	34
Investigation of contamination particles generation and surface chemical reactions on Al2O3, Y2O3, and YF3 coatings in F-based plasma Jongho So, MinJoong Kim, Hyuksung Kwon, Applied Surface Science Materials ScienceThermal Spray CoatingChemical EngineeringSurface Chemical ReactionsF-based Plasma	2023	30
Determination of low 137Cs concentration in seawater using ammonium 12-molybdophosphate adsorption and chemical separation method J.H. Park, Byung-Uck Chang, Y.J. Kim, Journal of Environmental Radioactivity Environmental ChemistryChemical EngineeringLow 137CsChemical Separation MethodEngineering	2008	28
Low-Temperature Fabrication (≤150 °C) of High-Quality Sputtered Silicon Oxide Thin Film with Hydrogen Plasma Treatment Taewon Seo, Hyuk Park, Gilsu Jeon, ACS Applied Electronic Materials EngineeringOptoelectronic DevicesIntegrated CircuitsThin Film Process TechnologySilicon On Insulator	2020	28
Effect of the Gas‐Phase Reaction in Metallorganic Chemical Vapor Deposition of TIN from Tetrakis(dimethylamido)titanium Ju‐Young Yun, Man‐Young Park, Shi‐Woo Rhee Journal of The Electrochemical Society	1998	27

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