Concepedia

Khaliq A. Chaudhary

KA

4

Publications

116

Citations

4

H-Index

1994

Active since

Affiliations

Tokyo Institute of Technology(Current)

Khaliq A. Chaudhary is an author at Tokyo Institute of Technology specializing in engineering, thin films, and applied physics.

Top concepts

EngineeringThin FilmsApplied PhysicsSurface ScienceMaterial ScienceChemistryPulse PowerSpectroscopyPlasma TheoryPlasma Physics

Publications per year

1994–2003

4

Publications

4

Open air deposition of SiO2 film from a cold plasma torch of tetramethoxysilane-H2-Ar system

Kiyoto Inomata, Hyun‐Kwon Ha, Khaliq A. Chaudhary et al. · Applied Physics Letters · 1994 · 54 citations

Materials Science, Sio2 Film, Open Air Deposition +15

Characterization of Argon Plasma by Use of Optical Emission Spectroscopy and Langmuir Probe Measurements

A. Qayyum, Manzoor Ikram, M. Zakaullah et al. · International Journal of Modern Physics B · 2003 · 32 citations

Engineering, Glow Discharge, Optical Emission Spectroscopy +16

Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure

Hideomi Koinuma, Takao Horiuchi, Kiyoto Inomata et al. · Pure and Applied Chemistry · 1996 · 16 citations · Full text

Materials Science, Engineering, Carbon-based Material +7

Open-air silicon etching by H2–He–CH4 flowing cold plasma

Khaliq A. Chaudhary, Kiyoto Inomata, Mamoru Yoshimoto et al. · Materials Letters · 2003 · 14 citations

Engineering, Plasma Simulation, Surface Science +4

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