J. Hållstedt

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Active since

2004

Affiliations

KTH Royal Institute of Technology(Current)

J. Hållstedt is an author at KTH Royal Institute of Technology specializing in engineering, materials engineering, and semiconductor device materials.

Publications per year

2004–2007

Publications

The effect of carbon and germanium on phase transformation of nickel on Si1−x−yGexCy epitaxial layers

J. Hållstedt, Mats Blomqvist, Per O. Å. Persson et al. · Journal of Applied Physics · 2004 · 44 citations

Engineering, Materials Engineering, Materials Science +15

High boron incorporation in selective epitaxial growth of SiGe layers

Reza Ghandi, Mohammadreza Kolahdouz, J. Hållstedt et al. · Journal of Materials Science Materials in Electronics · 2007 · 12 citations

Engineering, Materials Engineering, Materials Science +15

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