Yohei Kotsugi

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects

Yohei Kotsugi, Seung‐Min Han, Youn‐Hye Kim et al. · Chemistry of Materials · 2021 · 70 citations

Natural Sciences, Materials Engineering, Materials Science +16

Atomic Layer Deposited RuO₂ Diffusion Barrier for Next Generation Ru‐Interconnects

Youn‐Hye Kim, Minsu Kim, Yohei Kotsugi et al. · Advanced Functional Materials · 2022 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +16

Self‐Formation of a Ru/ZnO Multifunctional Bilayer for the Next‐Generation Interconnect Technology via Area‐Selective Atomic Layer Deposition

Yuki Mori, Taehoon Cheon, Yohei Kotsugi et al. · Small · 2023 · 19 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Development of RuS ₂ for near‐infrared photodetector by atomic layer deposition and post‐sulfurization

Tatsuya Nakazawa, Donghyun Kim, Jaehyeok Kim et al. · Rare Metals · 2022 · 10 citations

Natural Sciences, Materials Engineering, Materials Science +17