Jiří Houška

Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance

J. Vlček, Štěpán Potocký, Jiří Houška et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2005 · 84 citations

Materials Science, Materials Engineering, Electrical Engineering +13

Overview of optical properties of Al2O3 films prepared by various techniques

Jiří Houška, J. Blažek, J. Rezek et al. · Thin Solid Films · 2012 · 79 citations

Materials Science, Materials Engineering, Aluminium Nitride +11

Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

J. Vlček, J. Rezek, Jiří Houška et al. · Surface and Coatings Technology · 2013 · 79 citations

Materials Science, Magnetism, Materials Engineering +9

Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

J. Vlček, J. Rezek, Jiří Houška et al. · Vacuum · 2014 · 63 citations

Materials Science, Magnetism, Materials Engineering +4

Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering

Jiří Houška, J. Vlček, Štěpán Potocký et al. · Diamond and Related Materials · 2006 · 62 citations

Materials Engineering, Electrical Engineering, Engineering +7