Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films - Concepedia

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Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

79

Citations

39

References

2013

Year

J. Vlček, J. Rezek, Jiří Houška, R. Čerstvý, R. Bugyi

Surface and Coatings Technology

Materials ScienceMagnetismMaterials EngineeringEngineeringTa2o5 FilmsOxide ElectronicsApplied PhysicsProcess StabilizationDeposition RateThin FilmsChemical DepositionThin Film Processing

References

	Year	Citations

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