Toshihiko Iwao

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Active since

2017

Affiliations

Toshihiko Iwao is an author at Tokyo Electron (Japan) specializing in plasma-enhanced atomic layer deposition, silicon nitride, and semiconductor surfaces.

ORCID

Publications per year

2017–2018

Publications

Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition

Toshihiko Iwao, Peter L. G. Ventzek, Rochan Upadhyay et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 16 citations

Engineering, Materials Engineering, Materials Science +17

Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen

Gregory Hartmann, Peter L. G. Ventzek, Toshihiko Iwao et al. · Physical Chemistry Chemical Physics · 2018 · 14 citations

Natural Sciences, Chemistry, Materials Science +17

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