K. v. Sichart is an author at Siemens (Germany) specializing in engineering, applied physics, and electrical engineering.
Top concepts
EngineeringApplied PhysicsNanoelectronicsMicroelectronicsElectrical EngineeringMaterial ScienceElectronic PackagingElectrical InsulationThin FilmsDielectrics
Publications per year
1990–1991
3
3
Improvement of oxide quality by rapid thermal annealing
H. Wendt, A. Spitzer, Wolfgang Bensch et al. · Journal of Applied Physics · 1990 · 17 citations
Rows per page
1–3 of 3