P. J. McElheny - Concepedia

Author

P. J. McElheny

Also Known As

P. J. McElheny, P.J. McElheny, Peter J. McElheny, Peter J. McElheny Peter J. McElheny, Peter J. Mcelheny, Peter J. Mcelheny Peter J. Mcelheny

Publications

342

Citations

H-Index

Concepts

All Affiliations

Pennsylvania State University Electrotechnical Institute

About

P. J. McElheny is an author at Pennsylvania State University specializing in engineering, applied physics, and solar cell materials.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	310
2	Applied Physics	8	8	310
3	Materials Science	5	5	252
4	Electrical Engineering	4	4	199
5	Chemistry	1	1	37

P. J. McElheny

Publications

310

Citations

H-Index

Page 1

	Year	Citations
Range of validity of the surface-photovoltage diffusion length measurement: A computer simulation P. J. McElheny, J. K. Arch, Henry Lin, Journal of Applied Physics EngineeringDiffusion LengthPhotovoltaic DevicesThin Film Process TechnologyPhotovoltaic System	1988	141
Characterization of Hydrogenated Amorphous Silicon Films by a Pulsed Positron Beam Ryoichi Suzuki, Yoshinori Kobayashi, T. Mikado, Japanese Journal of Applied Physics Materials ScienceSemiconductorsEngineeringPhysicsCrystalline Defects	1991	43
Preparation of stable and photoconductive hydrogenated amorphous silicon from a Xe-diluted silane plasma Akihisa Matsuda, Satoshi Mashima, Kazuhiro Hasezaki, Applied Physics Letters EngineeringXe-diluted Silane PlasmaOptoelectronic DevicesThin Film Process TechnologyChemistry	1991	37
Influence of illumination conditions on the spectral response of hydrogenated amorphous silicon Schottky barrier structures P. Chatterjie, P. J. McElheny, Stephen J. Fonash Journal of Applied Physics Short Wavelength OpticOptical MaterialsEngineeringSilicon On InsulatorPhotovoltaics	1990	24
In Situ Ultraviolet Laser Treatment during Plasma Deposition for the Improvement of Film Qualities in Hydrogenated Amorphous Silicon Atsushi Suzuki, Yasutake Toyoshima, P. J. McElheny, Japanese Journal of Applied Physics Optical MaterialsPlasma DepositionEngineeringLaser ApplicationsOptoelectronic Devices	1991	21
Collection efficiency of <i>a</i>-Si:H Schottky barriers: A computer study of the sensitivity to material and device parameters P. J. McElheny, P. Chatterjie, Stephen J. Fonash Journal of Applied Physics EngineeringSilicon On InsulatorPhotovoltaicsSemiconductor DeviceCollection Efficiency	1991	19
Assessment of the surface-photovoltage diffusion-length measurement P. J. McElheny, J. K. Arch, Stephen J. Fonash Applied Physics Letters Surface-photovoltage Diffusion-length ExperimentEngineeringOptoelectronic DevicesPhotovoltaicsSemiconductor Nanostructures	1987	15
Structural Differences between Hydrogenated and Deuterated Amorphous Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition P. J. McElheny, Atsushi Suzuki, Satoshi Mashima, Japanese Journal of Applied Physics Materials ScienceSemiconductorsPhotodegradation RateStructural DifferencesEngineering	1991	10

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