Publication | Closed Access
Strain relief in compositionally graded Si1-xGex formed by high dose Ion implantation
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Citations
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References
1991
Year
Materials ScienceIon ImplantationEngineeringCrystalline DefectsMicrofabricationApplied PhysicsSemiconductor Device FabricationIon BeamSilicon On InsulatorMicroelectronicsStrain ReliefMechanics Of MaterialsMicrostructure
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