Amorphous silicon technology -- 1996

Abstract

The symposium, Amorphous Silicon Technology -- 1996, was held April 8--12, 1996, in San Francisco, California. Recent advances in solar cells incorporating microcrystalline silicon absorber layers are described in an invited paper. The patterning and texturing of amorphous silicon was described using pulsed lasers which selectively crystallize sections of an amorphous layer. Also included were descriptions of manufacturing facilities for amorphous-silicon-based tandem solar cells, various semiconductor devices, deposition technologies, growth processes, microstructure and defects in silicon films, transport and recombination processes, and device applications. One hundred and thirty three papers were processed separately for inclusion on the data base.