Rational utilization of the size and electronic effect of inhibitors enabling high polishing rate with minimum corrosion in copper chemical mechanical polishing

Pengfei Chang, Zisheng Huang, Yulong Chen, Huiqin Ling, Yunwen Wu, Ming Li, Yosi Shacham‐Diamand, Tao Hang

Applied Surface Science · 2024 · 17 citations · 59 references

Concepts

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