Surface microtopography evolution of monocrystalline silicon in chemical mechanical polishing

Contact of nominally flat surfaces

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A reactive molecular dynamics simulation of the silica-water interface

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Effects of particle size, polishing pad and contact pressure in free abrasive polishing

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A variational method for the calculation of ro-vibronic levels of any orbitally degenerate (Renner-Teller) triatomic molecule

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Diffusion of Water into Silica Glass at Low Temperature

Hajimu Wakabayashi, M. Tomozawa · Journal of the American Ceramic Society · 1989 · 139 citations

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