A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics

Abstract

, compared with traditional solid abrasives. Based on molecular dynamics (MD) simulations, a novel atomic removal model is proposed for mesoporous abrasives through the immediate elastic recovery of atoms. MD simulations suggest that the formation of convex peaks and pits was inhibited by the mesoporous structure, promoting uniform distribution of surface atoms and atomic removal. This is different from a conventional simple increase of polishing times. In addition, more bridge bonds of Si-O-Si and a lower average Si-O bond order are produced in fused silica samples due to their mesoporous structure, contributing to a higher MRR.