Nanoscale · 2023 · 16 citations · 33 references
EngineeringMaterials EngineeringMaterials ScienceNanomaterialsNanotechnologyPhotonicsEtching ProcessesLaser Surface ProcessingMask FabricationNanoelectronicsSurface ModificationChemical EtchingDevice FabricationEtchingLithium NiobateNanohole ArraysSelective EtchingSelectivityWet Etching
, which is enhanced by a factor of ∼660 in comparison to previous reports without laser irradiation. Such high selectivity in chemical etching helps realize high-performance maskless nanolithography in lithium niobate. In the experiment, we have fabricated high-quality LN nanohole arrays. The nanohole size reaches ∼100 nm and its aspect ratio is above 40 : 1. The minimal period of the LN hole array is 300 nm. Our work paves a way to fabricate LN nano-integrated devices for advanced optic and electronic applications.
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