Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison

Axel Sonnenfeld, T. M. Tun, K. V. Kozlov, H-E Wagner, J. F. Behnke, R. Hippler

Plasmas and Polymers · 2001 · 129 citations · 23 references

References

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