Publication | Closed Access
Growth characteristics and properties of Ga<sub>2</sub>O<sub>3</sub> films fabricated by atomic layer deposition technique
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Citations
93
References
2022
Year
Materials ScienceMaterials EngineeringGrowth CharacteristicsOptical MaterialsEngineeringCrystal StructureEpitaxial GrowthSurface ScienceApplied PhysicsGa 2Characterization TechniquesGallium OxideThin Film Process TechnologyThin FilmsChemical DepositionMolecular Beam EpitaxyChemical Vapor DepositionThin Film Processing
The review summarizes the precursors, characterization techniques, factors moderating film growth, and the properties such as crystal structure, chemical composition, surface morphology, and optical properties of Ga 2 O 3 films fabricated by ALD.
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