Characterization of Fenton reaction-based material removal on single crystal diamond surface

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A novel slurry for chemical mechanical polishing of single crystal diamond

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Diamond polishing

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Chemical mechanical polishing of thin film diamond

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The influence of concentration of hydroxyl radical on the chemical mechanical polishing of SiC wafer based on the Fenton reaction

Jiabin Lu, Run Chen, Huazhuo Liang et al. · Precision Engineering · 2017 · 119 citations

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