Designing two-dimensional temperature profiles using tunable thermoplasmonics

Abstract

) based on slowing down heat exchange through a 1D waveguide heatsink bridging the nanostructure and the highly thermal conducting thermostat. The rationale for this concept is evidenced through optical heating of a 2D array of stacked titanium nitride (TiN) (plasmonic refractory nanoheater) and height-controlled silicon (Si) (1D waveguide heatsink) cylinders. Depending on the Si pillar height, the temperature rise of a TiN : Si voxel ranges from a few up to thousands of degrees at a fixed pump power. The temperature of the TiN : Si voxel is remotely measured from the Raman shift of the Si pillar. Using ellipsometry, we find a temperature threshold of 400 °C, above which the thin TiN film is chemically degraded due to oxidation. The latter enables fine tailoring of thermal gradients using TiN : Si voxels of equal size but different permittivity. These findings contribute towards the development of tunable thermoplasmonics by demonstrating programmable non-uniform temperature profiles in the steady-state regime under continuous-wave laser illumination for a variety of thermo-optical applications.