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A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography

34

Citations

40

References

2022

Year

Abstract

A novel dual-tone molecular glass (AD-10Boc) resist was developed for electron beam lithography. The AD-10Boc resist can resolve dense line patterns of 21 nm and 30 nm L/S for negative-tone and positive-tone development, respectively.

References

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