Publication | Closed Access
A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography
34
Citations
40
References
2022
Year
EngineeringElectron-beam LithographyAd-10boc ResistOptical GlassChemistryBeam LithographyNanoelectronicsOptical PropertiesFunctional GlassNanolithography MethodElectron Beam LithographyMaterials SciencePhysicsNanotechnologyAdamantane DerivativesMolecular EngineeringMicroelectronicsDense Line PatternsNatural SciencesApplied PhysicsOptoelectronics
A novel dual-tone molecular glass (AD-10Boc) resist was developed for electron beam lithography. The AD-10Boc resist can resolve dense line patterns of 21 nm and 30 nm L/S for negative-tone and positive-tone development, respectively.
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