Photoelectron microscopy

Abstract

The physical principles, the experimental realization, the methodology and the application of synchrotron radiation-induced non-scanning photoemission electron microscopy (XPEEM) are discussed, including the combination with low-energy electron microscopy and the corresponding diffraction and spectroscopy techniques. Standard XPEEM that uses the slow secondaries for imaging is extended to imaging with energy-selected electrons by the addition of an imaging energy filter that allows to select photoelectrons, Auger electrons or a narrow energy window in the secondary-electron distribution. This combination of techniques leads to spectroscopic photoemission and low-energy electron microscopy (SPELEEM) which allows a comprehensive characterization of surfaces and thin films on the 10 nm scale. {}