Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe - Concepedia

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Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

29

Citations

16

References

1999

Year

Charles R. Eddy, D. Leonhardt, V. A. Shamamian, J. R. Meyer, C. A. Hoffman, J. E. Butler

Journal of Electronic Materials

Electrical EngineeringPlasma ElectronicsEngineeringCh4/h2/ar High DensitySurface ScienceApplied PhysicsGas Discharge PlasmaMicroelectronicsPlasma EtchingPlasma ProcessingPlasma Application

References

	Year	Citations

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