Angewandte Chemie · 2017 · 10 citations · 22 references
Natural SciencesChemistryMaterials ScienceMaterials CharacterizationMaterials ChemistryThin FilmsAmorphous SemiconductorsSemiconductor SurfacesSilicon MaterialsAmorphous SiliconConductivityElectrical Conductivity MeasurementsLight AbsorptionLight Absorption EnhancementSiliconSilicon ChemistrySilicon Thin Films
Abstract Herein a convenient synthetic method to obtain 2,2,3,3‐tetrasilyltetrasilane 3 and 2,2,3,3,4,4‐hexasilylpentasilane 4 on a multigram scale is presented. Proton‐coupled 29 Si NMR spectroscopy and single‐crystal X‐ray crystallography enabled unequivocal structural assignment. Owing to their unique properties, which are reflected in their nonpyrophoric character on contact with air and their enhanced light absorption above 250 nm, 3 and 4 are valuable precursors for liquid‐phase deposition (LPD) and the processing of thin silicon films. Amorphous silicon (a‐Si:H) films of excellent quality were deposited starting from 3 and characterized by conductivity measurements, ellipsometry, optical microscopy, and Raman spectroscopy.
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Solution-processed silicon films and transistors
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