Growth and characterization of Si-doped Ga2O3 thin films by remote plasma atomic layer deposition: Toward UVC-LED application - Concepedia

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Growth and characterization of Si-doped Ga2O3 thin films by remote plasma atomic layer deposition: Toward UVC-LED application

33

Citations

48

References

2022

Year

Xiaoying Zhang, Yue Yang, Wei‐Hang Fan, Chen Wang, Wan-Yu Wu, Ming-Chun Tseng, Dong‐Sing Wuu, Peng Gao, Hao‐Chung Kuo, Shui‐Yang Lien,

Surface and Coatings Technology

Materials ScienceEngineeringSurface ScienceApplied PhysicsGallium OxideThin FilmsChemical Vapor DepositionEpitaxial GrowthToward Uvc-led ApplicationThin Film Processing

References

	Year	Citations

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