Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications

K. Naveen Kumar, Habibuddin Shaik, Amulya Pawar, L. N. Chandrashekar, Sheik Abdul Sattar, G Nithya, R. Imran Jafri, V. Madhavi, Jyothi Gupta, G.V. Ashok Reddy

Materials Today Proceedings · 2021 · 26 citations · 22 references

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