Publication | Closed Access
M-center in 4H-SiC: Isothermal DLTS and first principles modeling studies
19
Citations
48
References
2021
Year
EngineeringBistable DefectDefect ToleranceIon ImplantationDeep LevelsNanoelectronicsThermodynamicsMaterials EngineeringSemiconductor TechnologyElectrical EngineeringPhysicsDefect FormationHeat TransferMicroelectronicsPower DeviceFirst PrinciplesApplied PhysicsCondensed Matter PhysicsActivation EnergyThermal EngineeringCarbide
We report on a bistable defect known as M-center, here introduced in n-type 4H-SiC by 2 MeV He ion implantation. Deep levels of the M-center are investigated by means of junction spectroscopy techniques, namely, deep level transient spectroscopy (DLTS) and isothermal DLTS. In addition to previously reported three deep levels arising from the M-center (labeled as M1, M2, and M3), we provide direct evidence on the existence of a fourth transition (labeled as M4) with an activation energy of 0.86 eV. Activation energies and apparent capture cross sections for all four metastable defects are determined. From first-principles calculations, it is shown that the observed features of the M-center, including the charge state character, transition levels, bi-stability dynamics, and annealing, are all accounted for by a carbon self-interstitial.
| Year | Citations | |
|---|---|---|
Page 1
Page 1